Dr. Christian Hoppe

Technische Chemie - Arbeitskreis Grundmeier

Ehemaliger

E-Mail:
hoppe@tc.uni-paderborn.de
Telefon:
+49 5251 60-5743
Web:
Homepage
Büro­anschrift:
Warburger Str. 100
33098 Paderborn
Raum:
NW2.729

Publikationen

Aktuelle Publikationen

Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO <sub> <i>x</i> </sub> thin films on PDMS

C. Hoppe, F. Mitschker, L. Mai, M.O. Liedke, T. Arcos, P. Awakowicz, A. Devi, A.G. Attallah, M. Butterling, A. Wagner, G. Grundmeier, Plasma Processes and Polymers 19 (2022).

DOI

Atomic Layer Deposition of Copper Metal Films from Cu(acac) <sub>2</sub> and Hydroquinone Reductant

T.S. Tripathi, M. Wilken, C. Hoppe, T. de los Arcos, G. Grundmeier, A. Devi, M. Karppinen, Advanced Engineering Materials 23 (2021).

DOI

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices

L. Mai, D. Zanders, E. Subaşı, E. Ciftyurek, C. Hoppe, D. Rogalla, W. Gilbert, T. de los Arcos, K. Schierbaum, G. Grundmeier, C. Bock, A. Devi, ACS Applied Materials & Interfaces (2019) 3169–3180.

DOI

A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD

M. Gebhard, F. Mitschker, C. Hoppe, M. Aghaee, D. Rogalla, M. Creatore, G. Grundmeier, P. Awakowicz, A. Devi, Plasma Processes and Polymers (2018).

DOI

Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms

C. Hoppe, F. Mitschker, I. Giner, T. de los Arcos, P. Awakowicz, G. Grundmeier, Journal of Physics D: Applied Physics (2017).

DOI

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